Laser-induced plasma is not a type of plasma source. It is a technique for generating plasma using a laser.

In a DC glow discharge plasma source, plasma is generated by collisional ionization of gas atoms by energetic electrons.

Inductively coupled plasma (ICP) sources are commonly used in the production of semiconductors due to their high plasma density and low contamination.

Microwave discharge plasma sources are primarily used in material processing applications, such as etching, deposition, and surface modification.

Helicon plasma sources are characterized by a high degree of ionization and a low electron temperature due to the efficient coupling of radio frequency power to the plasma.

Radio frequency discharge plasma sources have reduced electrode erosion compared to DC glow discharge plasma sources due to the absence of a direct current path between the electrodes.

Pulsed plasma sources are commonly used in the generation of high-power plasma jets due to their ability to produce short, intense pulses of plasma.

In a radio frequency discharge plasma source, plasma is generated by the resonant absorption of electromagnetic waves by the gas atoms.

Capacitively coupled plasma (CCP) sources are commonly used in the production of flat panel displays due to their ability to generate uniform and low-pressure plasma.

Microwave discharge plasma sources have higher plasma density compared to radio frequency discharge plasma sources due to the more efficient coupling of microwave power to the plasma.

Tokamaks are commonly used in the generation of plasma for fusion energy research due to their ability to confine high-temperature plasma for extended periods of time.

In a DC glow discharge plasma source, plasma is generated by collisional ionization of gas atoms by energetic electrons.

Plasma enhanced chemical vapor deposition (PECVD) sources are commonly used in the production of solar cells due to their ability to deposit thin films with high uniformity and low defect density.

ICP sources have higher plasma density compared to DC glow discharge plasma sources due to the more efficient coupling of radio frequency power to the plasma.

Capacitively coupled plasma (CCP) sources are commonly used in the generation of plasma for plasma etching due to their ability to generate uniform and low-pressure plasma.